TSMC backs ASML’s plan for bigger masks so its newest machines can print AI’s biggest chips

ASML and TSMC have agreed to advance from 6-inch to 12-inch photomasks for ASML's High NA lithography machines, enabling single-shot printing of larger AI chips and improving throughput by 40%. TSMC plans to pilot 12-inch masks by 2031, with production readiness around 2033.